发明授权
- 专利标题: Method and apparatus for exposing photosensitive material
- 专利标题(中): 用于曝光感光材料的方法和设备
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申请号: US454728申请日: 1982-12-30
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公开(公告)号: US4496216A公开(公告)日: 1985-01-29
- 发明人: James J. Cowan
- 申请人: James J. Cowan
- 申请人地址: MA Cambridge
- 专利权人: Polaroid Corporation
- 当前专利权人: Polaroid Corporation
- 当前专利权人地址: MA Cambridge
- 主分类号: G02B5/32
- IPC分类号: G02B5/32 ; G03F7/20 ; G03H1/04 ; G02B5/18
摘要:
Exposure patterns are formed in photosensitive material by multiple beam laser interferometry by a method which involves exposing said photosensitive material simultaneously to at least three coherent beams of exposing radiation wherein the sources of said beams are arranged substantially symmetrically around an axis perpendicular to the plane of said photosensitive material. Preferably, surface relief patterns are formed by developing said exposed material. Apparatus for providing such multiple coherent beams is also disclosed.
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