发明授权
- 专利标题: Exposure apparatus
- 专利标题(中): 曝光装置
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申请号: US401895申请日: 1982-07-26
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公开(公告)号: US4521082A公开(公告)日: 1985-06-04
- 发明人: Akiyoshi Suzuki , Hirosi Sato , Takashi Omata , Masao Kosugi
- 申请人: Akiyoshi Suzuki , Hirosi Sato , Takashi Omata , Masao Kosugi
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX56-124211 19810808
- 主分类号: G03B27/32
- IPC分类号: G03B27/32 ; G03F7/20 ; G03F9/00 ; H01L21/027 ; H01L21/30 ; G02F1/01
摘要:
An exposure apparatus includes a reticle provided with at least one mark, and operates on a wafer provided with at least one mark. The apparatus further includes a projection optical system for optically conjugately relating the reticle to the wafer, a mark detecting apparatus for detecting the mark of the reticle and detecting the mark of the wafer through the projection optical system, an illuminator for illuminating the wafer with a sensitizing light, and a phase converting element fixed between the wafer and the reticle for varying the direction of polarization of a light coming from the mark provided on the wafer.