发明授权
- 专利标题: Exposure aperture frame construction for camera
- 专利标题(中): 相机曝光孔架构造
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申请号: US537423申请日: 1983-09-29
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公开(公告)号: US4530582A公开(公告)日: 1985-07-23
- 发明人: Hiroshi Hara , Takashi Tobioka , Takeshi Yoshino , Tetuo Nishikawa , Jiro Sekine
- 申请人: Hiroshi Hara , Takashi Tobioka , Takeshi Yoshino , Tetuo Nishikawa , Jiro Sekine
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX57-149807 19820410
- 主分类号: G03B1/42
- IPC分类号: G03B1/42 ; G03B1/48 ; G03B1/56 ; G03B17/00 ; G03B17/28 ; G03B17/30 ; G03B19/04
摘要:
An exposure aperture frame defining an exposure aperture includes at least a pivotable partition member with an inclined guide surface on the inner wall thereof which is pivoted by and thereby permits advancement of a film leader to a film take-up chamber so that the film leader can reach a film take-up chamber without any standstill within the exposure aperture frame. The inclined guide surface permits the forward end of the film leader to ride across the partition member. A spring urges the partition member toward a position in which it encloses the exposure aperture frame. That spring also releasably retains the partition member on a shaft on which it is pivoted. The partition member has a platform member extending toward the take-up chamber, which has an opening therethrough that provides access to the spring.
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