发明授权
- 专利标题: Light exposure apparatus with cooling means
- 专利标题(中): 具有冷却装置的曝光装置
-
申请号: US306606申请日: 1981-09-29
-
公开(公告)号: US4535234A公开(公告)日: 1985-08-13
- 发明人: Takashi Fujimura , Katsuyu Takahashi , Masahiro Nishizawa
- 申请人: Takashi Fujimura , Katsuyu Takahashi , Masahiro Nishizawa
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX55-135862 19801001
- 主分类号: G03B27/72
- IPC分类号: G03B27/72 ; G02B5/20 ; G03F7/20 ; H01J9/227 ; H01L21/02 ; H01L21/027 ; H01J7/24
摘要:
Light exposure apparatus comprises a light source, a spectral filter perivious to light of a prescribed wavelength range, a glass member whose cut-off frequency in the prescribed wavelength range is variable with temperature, and a temperature control for controlling the temperature of the glass member. Intensity of the light from the light source, passing through the spectral filter and glass member, and impinging upon the surface subject to light-exposure is controlled by the temperature control.
公开/授权文献
信息查询