发明授权
US4546152A Poly(p-dioxanone) polymers having improved radiation resistance
失效
具有改善的耐辐射性的聚(对 - 二恶烷酮)聚合物
- 专利标题: Poly(p-dioxanone) polymers having improved radiation resistance
- 专利标题(中): 具有改善的耐辐射性的聚(对 - 二恶烷酮)聚合物
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申请号: US587332申请日: 1984-03-07
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公开(公告)号: US4546152A公开(公告)日: 1985-10-08
- 发明人: Donald F. Koelmel , Dennis D. Jamiolkowski , Shalaby W. Shalaby , Rao S. Bezwada
- 申请人: Donald F. Koelmel , Dennis D. Jamiolkowski , Shalaby W. Shalaby , Rao S. Bezwada
- 申请人地址: NJ Somerville
- 专利权人: Ethicon, Inc.
- 当前专利权人: Ethicon, Inc.
- 当前专利权人地址: NJ Somerville
- 主分类号: A61L17/10
- IPC分类号: A61L17/10 ; A61L27/18 ; C08G63/672 ; C08G63/66
摘要:
An absorbable, radiation sterilizable, normally solid polymer comprising a copolyester that comprises repeating divalent units of the formulas:(A) --O--CO--CH.sub.2 --O--CH.sub.2 CH.sub.2 --, and(B) --G--, and(C) --O--CO--CHR--O--.sub.m Ph--O--CHR--CO--O--wherein G represents the residue after removal of the hydroxyl groups of a dihydric alcohol, wherein Ph represents 1,2-, 1,3-, or 1,4-phenylene or alkyl- or alkoxy-substituted phenylene, wherein m represents a number having a value of 0 or 1, wherein R represents hydrogen or lower alkyl, and wherein the divalent units (A), (B), and (C) are bonded to each other through ester groups contained in said units.
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