发明授权
- 专利标题： Pattern inspection system
- 专利标题（中）： 图案检查系统
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申请号： US428605申请日： 1982-09-30
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公开(公告)号： US4547895A公开(公告)日： 1985-10-15
- 发明人: Kikuo Mita , Masayuki Oyama , Takashi Yoshida , Masato Nakashima , Katsumi Fujihara , Tadao Nakakuki
- 申请人： Kikuo Mita , Masayuki Oyama , Takashi Yoshida , Masato Nakashima , Katsumi Fujihara , Tadao Nakakuki
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX53-133610 19781030; JPX53-155946 19781113; JPX53-146865 19781128; JPX53-146870 19781128
- 主分类号： G01B11/02
- IPC分类号： G01B11/02 ; G06K9/54 ; G06T7/60 ; G06K9/00
摘要：
A pattern inspection system for inspecting a pattern formed on a base, such as a photomask, by means of laser beam scanning which includes a device for detecting the body and edges of the pattern, a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern, and a device for eliminating pinholes and stains within the pattern.
信息查询
