发明授权
- 专利标题: Systems for producing electroplated and/or treated metal foil
- 专利标题(中): 用于生产电镀和/或处理的金属箔的系统
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申请号: US670232申请日: 1984-11-13
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公开(公告)号: US4549950A公开(公告)日: 1985-10-29
- 发明人: Ned W. Polan , Raymond J. Smialek , Arvind Parthasarathi
- 申请人: Ned W. Polan , Raymond J. Smialek , Arvind Parthasarathi
- 申请人地址: CT New Haven
- 专利权人: Olin Corporation
- 当前专利权人: Olin Corporation
- 当前专利权人地址: CT New Haven
- 主分类号: C25D1/04
- IPC分类号: C25D1/04 ; C25D7/06 ; C25D21/06 ; C25D21/18 ; C25D17/00
摘要:
The present invention relates to a system and a process for producing improved quality electrodeposited and/or treated metal or metal alloy foil to be used in electrical and electronic applications. The quality of the foil being produced and/or treated by the system is improved by providing each treatment tank in the system with a dual filtration system. The dual filtration system for each tank comprises a filter conditioning loop for substantially continuously withdrawing solution from the tank and removing particulate matter from the withdrawn solution and a system for removing surface impurities from the solution. In a first embodiment, the surface impurities removing system comprises an off-line solution filtration and replenishment system. In a second embodiment, the surface impurities removing system comprises a skimmer floating on the surface of the solution. The present invention has particular utility in systems for producing electrodeposited and/or treated copper foils.
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