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US4555464A Amorphous silicon electrophotographic photosensitive materials 失效
非晶硅电子照相感光材料

Amorphous silicon electrophotographic photosensitive materials
摘要:
An electrophotographic photosensitive material comprising a conductive support having thereon, in succession, a photoconductive layer composed of an amorphous material containing silicon atom and a barrier layer mainly composed of carbon and silicon, nitrogen and silicon, or oxygen and silicon, and further on the barrier layer a surface improvement layer having a composition of carbon and silicon of from 0.70/1 to 0.95/1 by atomic ratio in carbon/carbon+silicon, and the composition ratio being larger than that of the barrier layer.
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