发明授权
- 专利标题: Process for preparing a titanium carbide film
- 专利标题(中): 制备碳化钛膜的方法
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申请号: US523440申请日: 1983-08-16
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公开(公告)号: US4582728A公开(公告)日: 1986-04-15
- 发明人: Tetsuya Abe , Kounosuke Inagawa , Kenjiro Obara , Yoshio Murakami
- 申请人: Tetsuya Abe , Kounosuke Inagawa , Kenjiro Obara , Yoshio Murakami
- 申请人地址: JPX Tokyo
- 专利权人: Japan Atomic Energy Research Institute
- 当前专利权人: Japan Atomic Energy Research Institute
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX57-141624 19820817
- 主分类号: C01B31/30
- IPC分类号: C01B31/30 ; C23C14/00 ; C23C14/06 ; G21B1/11 ; G21B1/17
摘要:
A process for preparing a titanium carbide film characterized by vaporizing metallic titanium from a metallic titanium vaporizing source placed in an atmosphere containing a dilute acetylene gas and depositing titanium carbide onto the surface of base set up facing said source.
公开/授权文献
- US5660069A Hands-free duct assembly tool 公开/授权日:1997-08-26
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