发明授权
US4597843A Enhanced bulk porosity of polymer structures via plasma technology
失效
通过等离子体技术增强聚合物结构体积孔隙度
- 专利标题: Enhanced bulk porosity of polymer structures via plasma technology
- 专利标题(中): 通过等离子体技术增强聚合物结构体积孔隙度
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申请号: US660340申请日: 1984-10-12
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公开(公告)号: US4597843A公开(公告)日: 1986-07-01
- 发明人: Dennis W. Goupil , Mary T. Musolino
- 申请人: Dennis W. Goupil , Mary T. Musolino
- 申请人地址: CT Stamford
- 专利权人: American Cyanamid Company
- 当前专利权人: American Cyanamid Company
- 当前专利权人地址: CT Stamford
- 主分类号: D06M10/00
- IPC分类号: D06M10/00 ; B01D53/22 ; B01D67/00 ; B01D69/08 ; C08J7/00 ; C08J9/04 ; C08J9/06 ; C08J9/28 ; D01D5/24 ; D01F1/08 ; D01F6/00 ; D06M10/02 ; D06M101/00 ; D06M101/16 ; D06M101/30 ; B01D39/02
摘要:
A porous article is prepared by subjecting a substantially non-porous polymeric shaped article containing from about 1.0-30% of plasticizer to a plasma treatment under conditions such that the plasticizer is volatilized or decomposed into gaseous decomposition products thereby creating an internal pore structure while leaving the surface of the article essentially intact and free from microscopically visible pores.
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