发明授权
- 专利标题: X-ray mask with Ni pattern
- 专利标题(中): 带Ni图案的X光掩模
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申请号: US529710申请日: 1983-09-06
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公开(公告)号: US4599737A公开(公告)日: 1986-07-08
- 发明人: Takeshi Kimura , Hidehito Obayashi , Kozo Mochiji
- 申请人: Takeshi Kimura , Hidehito Obayashi , Kozo Mochiji
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX57-159653 19820916
- 主分类号: G03F1/00
- IPC分类号: G03F1/00 ; G03F1/22 ; G03F1/68 ; H01L21/027 ; G21K5/00
摘要:
An X-ray mask having a mask pattern formed from nickel or a material having nickel as a principal component supported on a thin membrane. The X-ray mask has characteristics substantially equal to those of the conventional X-ray mask employing Au as a mask pattern and is much lower in price than the Au-containing mask pattern. In addition, since the X-ray mask can easily be formed by electroless plating, it is possible to form a mask pattern with a higher accuracy than that in case of employing Au alone.
公开/授权文献
- US5062147A User programmable computer monitoring system 公开/授权日:1991-10-29