发明授权
- 专利标题: Apparatus for focusing a charged particle beam onto a specimen
- 专利标题(中): 用于将带电粒子束聚焦到样本上的装置
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申请号: US654457申请日: 1984-09-26
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公开(公告)号: US4605860A公开(公告)日: 1986-08-12
- 发明人: Satoru Fukuhara , Mikio Ichihashi , Hisaya Murakoshi , Shigemitsu Seitoh
- 申请人: Satoru Fukuhara , Mikio Ichihashi , Hisaya Murakoshi , Shigemitsu Seitoh
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX58-177954 19830928
- 主分类号: H01J37/21
- IPC分类号: H01J37/21 ; H01J37/28 ; H01J37/304 ; G01K1/08 ; H01J3/14
摘要:
Disclosed is an apparatus for focusing a charged particle beam onto a speciman, which comprises a scanner for scanning a pre-formed standard pattern with a charged particle beam, a converging unit capable of converging the charged particle beam onto a specimen, a detector for detecting secondary charged particles emitted as a result of scanning the standard pattern by the scanner, a circuit for deriving a standard frequency component determined by the period of scanning with the charged particle beam and the shape of the portion of the standard pattern in the region being scanned with the charged particle beam, and a circuit cooperating with the converging unit for finding the maximum value of the amplitude of the standard frequency component thereby identifying attainment of focusing of the charged particle beam with high accuracy.
公开/授权文献
- US5663018A Pattern writing method during X-ray mask fabrication 公开/授权日:1997-09-02