Invention Grant
US4613404A Materials which exhibit a surface active effect with vacuum baked
photoresists and method of using the same
失效
使用真空烘烤光刻胶表现出表面活性效果的材料及其使用方法
- Patent Title: Materials which exhibit a surface active effect with vacuum baked photoresists and method of using the same
- Patent Title (中): 使用真空烘烤光刻胶表现出表面活性效果的材料及其使用方法
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Application No.: US672326Application Date: 1984-11-16
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Publication No.: US4613404APublication Date: 1986-09-23
- Inventor: Masatoshi Tabei
- Applicant: Masatoshi Tabei
- Applicant Address: JPX Kanagawa
- Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee Address: JPX Kanagawa
- Main IPC: C23C28/00
- IPC: C23C28/00 ; G11B5/31 ; H01F41/34 ; C23F1/02 ; B44C1/22 ; C03C15/00 ; C03C25/06
Abstract:
A process for manufacturing a thin film magnetic head, the improvement wherein a metal, alloy or mixture thereof which improves the surface characteristics of a vacuum baked photoresist is deposited on the vacuum baked photoresist to thereby improve adhesion of a subsequently deposited layer.
Public/Granted literature
- US5142122A Fixing device for image forming equipment Public/Granted day:1992-08-25
Information query
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