Invention Grant
- Patent Title: X-ray lithography system
- Patent Title (中): X射线光刻系统
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Application No.: US651052Application Date: 1984-09-13
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Publication No.: US4618971APublication Date: 1986-10-21
- Inventor: Arnold Weiss , Herman P. Schutten , Louis Cartz , Gordon B. Spellman , Stanley V. Jaskolski , Peter H. Wackman, deceased
- Applicant: Arnold Weiss , Herman P. Schutten , Louis Cartz , Gordon B. Spellman , Stanley V. Jaskolski , Peter H. Wackman, deceased
- Applicant Address: OH Cleveland
- Assignee: Eaton Corporation
- Current Assignee: Eaton Corporation
- Current Assignee Address: OH Cleveland
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00 ; H05H1/04 ; G21K5/00 ; H01L21/302
Abstract:
A system is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma is repeatably generated in a first area directly from solid material without exploding the latter. X-rays are generated in a second area by passing high current through the plasma causing radial inward magnetic field pinching. Accurate control and improved intensity performance, and greater flexibility in selection of X-ray emitting materials, are provided by the separation of the plasma generating and the X-ray pinch generating functions. Common electrode structure is provided for plasma generating and for plasma pinching, which common electrode also provides a cylindrical plasma communication passage from the first to the second area, and provides an X-ray emission passage of desired axial orientation.
Information query
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