发明授权
- 专利标题: Substrate for planographic plate
- 专利标题(中): 平版印刷板基材
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申请号: US711965申请日: 1985-03-14
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公开(公告)号: US4642260A公开(公告)日: 1987-02-10
- 发明人: Kazuto Wakita , Kazuo Tsuchiya , Isao Nagayasu , Ikuo Emoto
- 申请人: Kazuto Wakita , Kazuo Tsuchiya , Isao Nagayasu , Ikuo Emoto
- 申请人地址: JPX Ube
- 专利权人: Ube Industries, Ltd.
- 当前专利权人: Ube Industries, Ltd.
- 当前专利权人地址: JPX Ube
- 优先权: JPX59-52205 19840321
- 主分类号: B41N1/14
- IPC分类号: B41N1/14 ; B41N1/08 ; B32B7/02 ; B32B15/08
摘要:
Disclosed is a substrate for planographic (lithographic) plate, which comprises metal foils with thicknesses of 5 to 100.mu. laminated onto both surfaces of a sheet which has a thickness of 30 to 400.mu., said sheet being obtained by sheet making of a modified polyolefin composite material comprising 100 parts by weight of a modified polyolefin resin graft-modified partially or wholly with an organic silane compound and 5 to 150 parts by weight of mica.