发明授权
- 专利标题: Apparatus and method for photochemical vapor deposition
- 专利标题(中): 光化学气相沉积的装置和方法
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申请号: US835331申请日: 1986-03-03
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公开(公告)号: US4654226A公开(公告)日: 1987-03-31
- 发明人: Scott C. Jackson , Richard E. Rocheleau
- 申请人: Scott C. Jackson , Richard E. Rocheleau
- 申请人地址: DE Newark
- 专利权人: The University of Delaware
- 当前专利权人: The University of Delaware
- 当前专利权人地址: DE Newark
- 主分类号: H01L21/205
- IPC分类号: H01L21/205 ; C23C16/48 ; H01L21/263 ; H01L21/31 ; B05D3/06
摘要:
A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.
公开/授权文献
- US5807155A Picture display plush toy 公开/授权日:1998-09-15
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