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US4654226A Apparatus and method for photochemical vapor deposition 失效
光化学气相沉积的装置和方法

Apparatus and method for photochemical vapor deposition
摘要:
A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.
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