发明授权
- 专利标题: Heat developable light-sensitive material
- 专利标题(中): 热可显影的感光材料
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申请号: US767981申请日: 1985-08-21
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公开(公告)号: US4668615A公开(公告)日: 1987-05-26
- 发明人: Ken Kawata , Yoshiharu Yabuki , Kozo Sato , Hiroyuki Hirai
- 申请人: Ken Kawata , Yoshiharu Yabuki , Kozo Sato , Hiroyuki Hirai
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX59-173889 19840821
- 主分类号: G03C8/40
- IPC分类号: G03C8/40 ; C07C51/00 ; C07C57/30 ; C07C61/39 ; C07C62/32 ; C07C67/00 ; C07C201/00 ; C07C205/56 ; C07C239/00 ; C07C279/02 ; C07C313/00 ; C07C317/44 ; C07D213/55 ; C07D215/12 ; C07D215/14 ; C07D263/56 ; G03C1/06 ; G03C1/498 ; G03C7/00 ; G03C1/40 ; G03C5/54
摘要:
A heat developable light-sensitive material containing a compound represented by the general formula (I):[Ar.sub.n (R).sub.3-n CCO.sub.2 H].sub.l .multidot.B.sub.m (I)wherein ar represents an aryl group or a heterocyclic group; R represents a substituent other than an aryl group and a heterocyclic group; Ar and R may be bonded in a part thereof to form a ring; B represents a mono- or diacidic base which has a pKa of 7 or more and contains 12 or less carbon atoms; n represents an integer from 1 to 3; l and m each represents an integer of 1 or 2 and maintain a relationship in that a number of positive charge and a number of negative charge are equal; when n represents 1 or 2, two R's or Ar's may be the same or different, when n represents 3, three Ar's may be the same or different; and the substituent represented by Ar or R may be further substituted with a substituent. The compound represented by the general formula (I) is a base precursor which is stable at normal temperature but rapidly decomposes to release a base by heating and therefore the heat developable light-sensitive material containing the base precursor has excellent preservability and provides images having good image quality, i.e., low fog density and high image density upon a short period of developing time.
公开/授权文献
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