发明授权
- 专利标题: Control system for semiconductor substrate process line
- 专利标题(中): 半导体衬底工艺线控制系统
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申请号: US802374申请日: 1985-11-27
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公开(公告)号: US4672185A公开(公告)日: 1987-06-09
- 发明人: Mitsuo Sato , Hiroshi Kamidoi
- 申请人: Mitsuo Sato , Hiroshi Kamidoi
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX59-249708 19841128
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; G06K7/10 ; H01L21/00
摘要:
A control system for a semiconductor substrate process line comprises a process line having processing units for processing a semiconductor wafer in accordance with preset data, a plurality of cassettes each for storing a plurality of semiconductor wafers and having an identification member on a surface thereof consisting of a plurality of projections arranged in a row, a non-contact type number reader provided at an entrance side of the processing unit for reading the cassette number designated by the identification member and generating a signal corresponding to the number, and a control unit in which processing conditions are input corresponding to the semiconductor wafers stored in the cassettes and which identifies the signal from the reader and controls the processing unit under processing conditions corresponding to the identified number.
公开/授权文献
- US5762016A Dock pole bumper assembly 公开/授权日:1998-06-09
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