Invention Grant
- Patent Title: Liquid metal ion source
- Patent Title (中): 液态金属离子源
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Application No.: US669796Application Date: 1984-11-09
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Publication No.: US4680507APublication Date: 1987-07-14
- Inventor: Kaoru Uemura , Tohru Ishitani , Hifumi Tamura
- Applicant: Kaoru Uemura , Tohru Ishitani , Hifumi Tamura
- Applicant Address: JPX Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JPX Tokyo
- Priority: JPX58-210854 19831111
- Main IPC: H01J27/26
- IPC: H01J27/26 ; H01J37/08 ; H01J7/24
Abstract:
A liquid metal ion source has a reservoir which holds a source material to-be-ionized in a melted state; an emitter which emits from its tip, ions of the melted source material fed from the reservoir; and an extracting electrode which applies a high electric field to the tip of the emitter, thereby to extract the ions from the tip of the emitter. The liquid metal ion source further comprises tank means for storing the source material to be fed to the reservoir, transfer means for transferring the source material from the tank means to the reservoir, and a vacuum chamber for holding the constituents in a vacuum state.
Public/Granted literature
- US5152975A Process for producing high purity hydrogen Public/Granted day:1992-10-06
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