发明授权
- 专利标题: MOSFET which reduces the short-channel effect
- 专利标题(中): 减少短沟道效应的MOSFET
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申请号: US763612申请日: 1985-08-08
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公开(公告)号: US4697198A公开(公告)日: 1987-09-29
- 发明人: Kazuhiro Komori , Kenichi Kuroda , Kousuke Okuyama
- 申请人: Kazuhiro Komori , Kenichi Kuroda , Kousuke Okuyama
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX59-173239 19840822; JPX60-134040 19850621
- 主分类号: H01L29/10
- IPC分类号: H01L29/10 ; H01L29/78
摘要:
Disclosed herein is a MOS-type field-effect transistor in which a semiconductor region having the same type of conductivity as the substrate and an impurity concentration higher than that of the substrate is formed under the channel so as to come at both ends thereof into contact with the source and drain regions. The semiconductor region restricts the extension of depletion layer from the source and drain regions, and restricts the short-channel effect. The junction capacity is small between the semiconductor region and the source and drain regions.
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