发明授权
- 专利标题: Method for preventing decomposition of silicon carbide articles during high temperature plasma furnace sintering
- 专利标题(中): 在高温等离子体炉烧结过程中防止碳化硅制品分解的方法
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申请号: US843788申请日: 1986-03-25
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公开(公告)号: US4698481A公开(公告)日: 1987-10-06
- 发明人: Jonathan J. Kim , Joel D. Katz
- 申请人: Jonathan J. Kim , Joel D. Katz
- 申请人地址: OH Cleveland
- 专利权人: Kennecott Corporation
- 当前专利权人: Kennecott Corporation
- 当前专利权人地址: OH Cleveland
- 主分类号: C04B35/565
- IPC分类号: C04B35/565 ; C04B35/64 ; F27B5/10 ; F27B17/00 ; F27D3/12 ; F27D5/00 ; F27D99/00 ; B23K15/00
摘要:
A system to prevent, retard or reverse the decomposition of silicon carbide articles during high temperature plasma sintering. Preferably, the system comprises sintering a silicon carbide refractory or ceramic green body in a closed sintering environment, such as a closed tube, with strategic placement of the plasma torch or torches, exhaust outlet and tube. As sintering proceeds, a silicon vapor pressure builds up within the tube, retarding the decomposition of the silicon carbide body. The plasma torch, exhaust outlet, and tubes are positioned so that buoyant convective flow is maximized to increase the heat transfer and energy efficiency. In another embodiment, a "sacrificial" source of silicon carbide is placed into the sintering furnace. The silicon carbide in the sacrificial source starts to decompose before the silicon carbide refractory or ceramic article, creating a supersaturated atmosphere of silicon vapor species in the furnace. This prevents, retards or reverses the silicon carbide decomposition reactions and thus maintains the integrity of the refractory or ceramic article being sintered. Preferably, the sacrificial source is placed in a closed sintering environment along with the silicon carbide articles being sintered.
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