发明授权
- 专利标题: Liquid phase epitaxial growth method
- 专利标题(中): 液相外延生长法
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申请号: US787369申请日: 1985-10-15
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公开(公告)号: US4702781A公开(公告)日: 1987-10-27
- 发明人: Yoichi Sasai , Minoru Kubo
- 申请人: Yoichi Sasai , Minoru Kubo
- 申请人地址: JPX Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX59-216654 19841016
- 主分类号: C30B19/10
- IPC分类号: C30B19/10 ; C30B19/00 ; C30B19/06 ; H01L21/208
摘要:
Disclosed is a liquid phase epitaxial growth method using a slider having a recess which receives a semiconductor substrate, and a growth boat having a solution holder which holds plural kinds of solutions for use in epitaxial growth, in which method, epitaxial growth of a layer having thickness of less than 500 .ANG. is carried out under the condition that the slider is sliding in one direction, i.e., without stopping the sliding movement of the slider. Thereby, the thickness of the growth layer is controlled by controlling the time when the substrate contacts the solution, or by the sliding speed of the slider.
公开/授权文献
- US5806273A Multi-storey concrete construction system 公开/授权日:1998-09-15
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