发明授权
- 专利标题: Plasma x-ray source
- 专利标题(中): 等离子X射线源
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申请号: US795776申请日: 1985-11-07
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公开(公告)号: US4715054A公开(公告)日: 1987-12-22
- 发明人: Yasuo Kato , Kunio Harada , Shigeo Kubota , Yoshio Watanabe , Seiichi Murayama
- 申请人: Yasuo Kato , Kunio Harada , Shigeo Kubota , Yoshio Watanabe , Seiichi Murayama
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX59-234925 19841109
- 主分类号: H01J35/22
- IPC分类号: H01J35/22 ; H05G2/00 ; H05H1/24 ; H01J35/00 ; H05G1/00
摘要:
A plasma X-ray source comprises inner and outer cylindrical electrodes disposed coaxially and with a certain distance with respect to each other, an electrical insulator disposed between end portions of the inner and outer cylindrical electrodes, and a discharge vessel disposed to envelop the inner and outer cylindrical electrodes. A pulse voltage is applied between the inner and outer cylindrical electrodes to produce plasma in the discharge vessel. An electrically conductive spherical shield is disposed to envelop a space where the plasma is pinched, and the spherical shield is maintained at a potential equal to that applied to the outer cylindrical electrode.
公开/授权文献
- US5791460A Eye-glasses holder especially for use in vehicles 公开/授权日:1998-08-11
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