发明授权
- 专利标题: Silicon film deposition from mixture of silanes
- 专利标题(中): 从硅烷混合物中沉积硅膜
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申请号: US867624申请日: 1986-05-27
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公开(公告)号: US4721664A公开(公告)日: 1988-01-26
- 发明人: Isamu Shimizu , Kyosuke Ogawa , Eiichi Inoue
- 申请人: Isamu Shimizu , Kyosuke Ogawa , Eiichi Inoue
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX56-33566 19810309; JPX56-33567 19810309; JPX56-37440 19810316
- 主分类号: C23C16/24
- IPC分类号: C23C16/24 ; G03G5/082 ; H01L31/0392 ; H01L31/20 ; G03G5/085
摘要:
A process for producing a photoconductive member comprises forming a photoconductive layer on a substrate for formation of a photoconductive layer by introducing starting substances for formation of a photoconductive layer under gaseous state into a deposition chamber maintained under a desired reduced pressure and exciting discharging under the gas atmosphere of said starting substances, characterized in that said starting substances are constituted of at least two compunds selected from the group consisting of the compounds of the formula:Si.sub.n H.sub.2n+2 (A)wherein n is a positive integer and the compounds of the formula:Si.sub.m H.sub.l X.sub.k (B)wherein m and k are positive integers, l is 0 or a positive integer, l+k=2m+2, and X represents a halogen atom, n and m being called "order number" hereinafter, and said starting substances to be introduced into said deposition chamber being controlled in amounts such that the proportion of the total of high order compounds is at least 1 vol. % based on the total of the minimum order compounds, the minimum order compound being one whose order number is the minimum among order numbers of said at least two compounds, the high order compound being one whose order number is higher than the order number of the minimum order compound.
公开/授权文献
- US6128649A Dynamic selection of media streams for display 公开/授权日:2000-10-03
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