发明授权
US4728869A Pulsewidth modulated pressure control system for chemical vapor
deposition apparatus
失效
用于化学气相沉积设备的脉宽调制压力控制系统
- 专利标题: Pulsewidth modulated pressure control system for chemical vapor deposition apparatus
- 专利标题(中): 用于化学气相沉积设备的脉宽调制压力控制系统
-
申请号: US845212申请日: 1986-03-27
-
公开(公告)号: US4728869A公开(公告)日: 1988-03-01
- 发明人: Noel H. Johnson , Gary C. Elliott
- 申请人: Noel H. Johnson , Gary C. Elliott
- 申请人地址: CA San Jose
- 专利权人: Anicon, inc.
- 当前专利权人: Anicon, inc.
- 当前专利权人地址: CA San Jose
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; C23C16/455 ; C23C16/52 ; G05D16/20 ; H02P5/16
摘要:
A low pressure control system for chemical vapor deposition (CVD) apparatus, including a vacuum pressure chamber and an exhaust pump, is provided by a vacuum pump DC motor which is supplied power from a DC motor speed controller coupled to a DC control input signal from a pulsewidth modulation DC converter. The converter receives a single pulsewidth modulated pulse train having its percentage of modulation controlled in accordance with a DC to pulsewidth modulation controller which operates in accordance with the difference between a pair of DC input signals corresponding to the actual pressure inside the vacuum pressure chamber and a desired or set point pressure respectively. The vacuum pump motor speed and accordingly the exhaust pump is controlled with a high degree of precision, thereby providing improved coating uniformity of semiconductor wafers being fabricated by the CVD apparatus.
公开/授权文献
- US5954183A Device for the transfer of products 公开/授权日:1999-09-21
信息查询
IPC分类: