发明授权
- 专利标题: Process for producing a temperature and moisture sensitive element
- 专利标题(中): 生产温湿度敏感元件的方法
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申请号: US800024申请日: 1985-11-20
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公开(公告)号: US4731257A公开(公告)日: 1988-03-15
- 发明人: Fusaoki Uchikawa
- 申请人: Fusaoki Uchikawa
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX59-268961 19841220; JPX59-268963 19841220
- 主分类号: G01K7/22
- IPC分类号: G01K7/22 ; G01N27/12 ; B05D5/12
摘要:
A process for producing a temperature and moisture sensitive element, which comprises a step of forming a first coating layer by applying a composition comprising a polymerized organo-silicon compound and an inorganic material onto a substrate, a step of forming a second coating layer apart from the first coating layer by applying the same composition as defined above onto the substrate, a step of heat-treating the first coating layer to form a moisture sensitive section, and a step of treating the second coating layer to form a temperature sensitive section by a treatment different from the heat treatment of the first coating layer.
公开/授权文献
- US6014375A TDMA radio protocol with adaptive vocoder selection 公开/授权日:2000-01-11
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