发明授权
US4740386A Method for depositing a ternary compound having a compositional profile
失效
沉积具有组成分布的三元化合物的方法
- 专利标题： Method for depositing a ternary compound having a compositional profile
- 专利标题（中）： 沉积具有组成分布的三元化合物的方法
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申请号： US31733申请日： 1987-03-30
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公开(公告)号： US4740386A公开(公告)日： 1988-04-26
- 发明人: Jeffrey T. Cheung
- 申请人： Jeffrey T. Cheung
- 申请人地址： CA El Segundo
- 专利权人： Rockwell International Corporation
- 当前专利权人： Rockwell International Corporation
- 当前专利权人地址： CA El Segundo
- 主分类号： C23C14/28
- IPC分类号： C23C14/28 ; H01L31/18 ; B05D3/06 ; B05D5/12 ; H01L31/00
摘要：
Thermal sources of Te and of Hg are provided in a vacuum chamber to furnish constant effusion of Te and Hg. Laser radiation is used to evaporate a beam of CdTe from a target of CdTe in the chamber. The laser radiation is modulated to vary the beam intensity of CdTe and thereby deposit a controlled compositional profile of Hg.sub.(1-x) Cd.sub.x Te on a substrate located in the chamber.
公开/授权文献
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