发明授权
US4740450A Method of making image reproducing material having scratch improvment
失效
制作具有划痕改进的图象再现材料的方法
- 专利标题： Method of making image reproducing material having scratch improvment
- 专利标题（中）： 制作具有划痕改进的图象再现材料的方法
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申请号： US1285申请日： 1987-01-08
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公开(公告)号： US4740450A公开(公告)日： 1988-04-26
- 发明人: Nobuyuki Tamaoki , Yoshio Katoh , Akitada Osako , Toshihiko Kajima , Shinichi Tanaka
- 申请人： Nobuyuki Tamaoki , Yoshio Katoh , Akitada Osako , Toshihiko Kajima , Shinichi Tanaka
- 申请人地址： JPX Osaka
- 专利权人： Toyo Boseki Kabushiki Kaisha
- 当前专利权人： Toyo Boseki Kabushiki Kaisha
- 当前专利权人地址： JPX Osaka
- 优先权： JPX58-170489 19830913
- 主分类号： G03F7/26
- IPC分类号： G03F7/26 ; G03C1/00 ; G03C5/00 ; G03F7/09 ; G03F7/11 ; G03C1/68
摘要：
An image reproducing material which comprises a support and at least a photosensitive resin layer and scratch resistance layer borne on the support, said scratch resistance layer containing a compound represented by AmBn, wherein A is mono- or divalent, straight or branched C.sub.11-20 aliphatic hydrocarbon; B is hydrogen, hydroxyl, amino, nitrile, aldehyde, carboxyl, or alkylamide, alkylester, ammonium salt or a periodic table group I-IV metal salt of a carboxylic acid; m is an integer of 1 to 3; and n is 1 or 2. A process for preparing the image reproducing material as well as a process for preparing an image reproduced material by using the image reproducing material are also described.
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