发明授权
US4760265A Method and device for detecting defects of patterns in microelectronic
devices
失效
用于检测微电子器件中图案缺陷的方法和装置
- 专利标题: Method and device for detecting defects of patterns in microelectronic devices
- 专利标题(中): 用于检测微电子器件中图案缺陷的方法和装置
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申请号: US3572申请日: 1987-01-15
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公开(公告)号: US4760265A公开(公告)日: 1988-07-26
- 发明人: Akihiro Yoshida , Takahide Iida , Hiroshi Miyake , Shuzo Hattori
- 申请人: Akihiro Yoshida , Takahide Iida , Hiroshi Miyake , Shuzo Hattori
- 申请人地址: JPX Kariya JPX Aichi
- 专利权人: Kabushiki Kaisha Toyoda Jidoshokki Seisakusho,Hattori; Shuzo
- 当前专利权人: Kabushiki Kaisha Toyoda Jidoshokki Seisakusho,Hattori; Shuzo
- 当前专利权人地址: JPX Kariya JPX Aichi
- 优先权: JPX61-008391 19860118; JPX61-228980 19860927
- 主分类号: G01N21/956
- IPC分类号: G01N21/956 ; G01N23/18
摘要:
An inspecting method and device for inspecting an object or objects such as photomasks having a plurality of identical patterns, to detect defects of the patterns, wherein the object is placed such that the patterns lie in the same plane, and an inspection mask having a plurality of translucent apertures is placed such that the inspection mask is adjacent and parallel to the object. The inspection mask and the object are moved relative to each other whereby each aperture is positioned opposite to mutually corresponding portions of the patterns. The object and inspection mask are irradiated with rays of light emitted in a direction substantially normal to the plane of relative movements thereof. The rays of light transmitted through the apertures and the object are converted into electric signals, and the electric signals associated with the corresponding portions of the patterns are compared with each other, prior to obtaining the electric signals of all of the plurality of patterns. If the electric signals of the corresponding portions of the patterns differ from each other, these portions are determined to be defective.
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