发明授权
- 专利标题: Magnetoresistive device
- 专利标题(中): 磁阻器件
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申请号: US63773申请日: 1987-06-24
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公开(公告)号: US4769093A公开(公告)日: 1988-09-06
- 发明人: Masahiro Kitada , Hideo Tanabe , Noboru Shimizu
- 申请人: Masahiro Kitada , Hideo Tanabe , Noboru Shimizu
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX59-254015 19841203
- 主分类号: G11B5/39
- IPC分类号: G11B5/39 ; H01L43/08 ; H01F1/04
摘要:
A magnetoresistive device includes a magnetoresistive film made of permalloy alloy. This thin film is formed on a substrate by sputtering or vapor deposition method. Thereafter, the thin film is heated to a temperature between 200.degree. C. and 350.degree. C. by flowing an electric current therethrough or irradiating the thin film with an electron or laser beam. It is desirable that the heat treatment is effected in an alternating magnetic field. The permalloy alloy may contain at least one element including Rh, Ru, Mo, Cr and V.
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