发明授权
US4774274A Thermally stabilized butadiene resins containing a hindered phenolic
acrylate or methacrylate
失效
含有受阻酚丙烯酸酯或甲基丙烯酸酯的热稳定丁二烯树脂
- 专利标题: Thermally stabilized butadiene resins containing a hindered phenolic acrylate or methacrylate
- 专利标题(中): 含有受阻酚丙烯酸酯或甲基丙烯酸酯的热稳定丁二烯树脂
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申请号: US64461申请日: 1987-06-22
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公开(公告)号: US4774274A公开(公告)日: 1988-09-27
- 发明人: Takeshi Takata , Shin-ichi Yachigo , Tatsuo Kaneoya , Haruki Okamura , Yukoh Takahashi
- 申请人: Takeshi Takata , Shin-ichi Yachigo , Tatsuo Kaneoya , Haruki Okamura , Yukoh Takahashi
- 申请人地址: JPX Osaka
- 专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人地址: JPX Osaka
- 优先权: JPX61-150565 19860625; JPX61-173301 19860723
- 主分类号: C08K5/134
- IPC分类号: C08K5/134 ; C08K5/10
摘要:
A process for producing a bisphenol compound useful as deterioration preventor capable of stabilizing organic substances against the decompositions caused by heat, light and oxygen, represented by the following general formula: ##STR1## wherein R.sub.1 represents alkyl group having 1 to 3 carbon atoms, alkenyl group having 2 to 4 carbon atoms, phenyl group or 2-phenylethenyl group; R.sub.2 represents alkyl group having 1 to 5 carbon atoms, or cyclohexyl group; R.sub.3 represents alkyl group having 1 to 9 carbon atoms, cyclohexyl group or phenyl group; and R.sub.4 represents alkyl group having 1 to 11 carbon atoms or phenyl group, which comprises reacting a carboxylic acid represented by the following general formula: ##STR2## wherein R.sub.1 is as defined above, with a bisphenol compound represented by the following general formula: ##STR3## wherein R.sub.2, R.sub.3 and R.sub.4 are as defined above, by the use of a halogenating agent in the presence of a dehydrohalogenating agent, as well as butadiene polymer compositions containing said bisphenol compounds.