发明授权
US4784933A Method for making lithographic printing plate using light wavelengths
over 700 .mu.m
失效
使用700μm以上的光波长制作平版印刷版的方法
- 专利标题: Method for making lithographic printing plate using light wavelengths over 700 .mu.m
- 专利标题(中): 使用700μm以上的光波长制作平版印刷版的方法
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申请号: US929477申请日: 1986-11-12
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公开(公告)号: US4784933A公开(公告)日: 1988-11-15
- 发明人: Eiji Kanada , Yasuo Tsubai , Akira Tanaka , Toshiro Kondo , Yoshikazu Takaya , Masahiko Saikawa , Hiroshi Nishinoiri
- 申请人: Eiji Kanada , Yasuo Tsubai , Akira Tanaka , Toshiro Kondo , Yoshikazu Takaya , Masahiko Saikawa , Hiroshi Nishinoiri
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Paper Mills, Ltd.
- 当前专利权人: Mitsubishi Paper Mills, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX60-254202 19851112; JPX61-191476 19860814
- 主分类号: G03F7/07
- IPC分类号: G03F7/07 ; G03C5/54 ; G03F7/06
摘要:
Lithographic printing plates which have such a high sensitivity as permitting use of semiconductor laser beam of low output, a high resolving power and a high printing endurance and are free from occurrence of scumming are made by a method which comprises imagewise exposing a light sensitive material which comprises a support and at least a silver halide emulsion layer and a surface physical development nuclei layer provided on the support, said emulsion layer comprising silver halide grains which contain at least silver bromide and containing at least one sensitizing dye having a maximum spectral sensitivity in the region of longer than 700 .mu.m and then developing the exposed light sensitive material with a silver complex diffusion transfer developer containing at least a thiocyanate. Further improvement can be obtained by providing an antihalation means to keep the reflectance of a light of longer than 700 .mu.m at 13-40%.
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