发明授权
US4789421A Gallium arsenide superlattice crystal grown on silicon substrate and
method of growing such crystal
失效
在硅衬底上生长的砷化镓超晶格晶体和生长这种晶体的方法
- 专利标题: Gallium arsenide superlattice crystal grown on silicon substrate and method of growing such crystal
- 专利标题(中): 在硅衬底上生长的砷化镓超晶格晶体和生长这种晶体的方法
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申请号: US780910申请日: 1985-09-27
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公开(公告)号: US4789421A公开(公告)日: 1988-12-06
- 发明人: Masayoshi Umeno , Shiro Sakai , Tetsuo Soga
- 申请人: Masayoshi Umeno , Shiro Sakai , Tetsuo Soga
- 申请人地址: JPX
- 专利权人: Daidotokushuko Kabushikikaisha
- 当前专利权人: Daidotokushuko Kabushikikaisha
- 当前专利权人地址: JPX
- 优先权: JPX59-213188 19841009
- 主分类号: C30B29/40
- IPC分类号: C30B29/40 ; C30B29/42 ; H01L21/18 ; H01L21/205 ; H01L29/267
摘要:
A GaAs growth crystal comprises a Si substrate, an intermediate layer formed on the substrate and a GaAs layer grown on the intermediate layer. The intermediate layer includes constituent GaP/GaAsP and GaAsP/GaAs superlattice layers and additionally AlP and AlGaP thin films.
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