A conductive laminate comprising a substrate (2), an intermedaite layer (3) provided on the substrate (2) and made of an amorphous metallic or semi-metallic oxide, and a transparent conductive layer (4) provided on the intermediate layer (3) and made of a crystalline metal or metallic oxide. The material of the conductive layer (4) is a member selected from among Au, Pd, Cr, Ni, SnO.sub.2, In.sub.2 O.sub.3, ZnO, TiO.sub.2, CdO, CdO--SnO.sub.2, and ITO. The material of the intermediate layer (3) is a member selected from among SnO.sub.2, ITO, SiO.sub.2 and Al.sub.2 O.sub.3. The thickness of the conductive layer (4) is 200 to 10,000 .ANG.. The thickness of the intermediate layer (3) is 80 to 300 .ANG..