发明授权
- 专利标题: Process for formation of base and light-sensitive material
- 专利标题(中): 形成基质和感光材料的方法
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申请号: US74120申请日: 1987-07-16
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公开(公告)号: US4835272A公开(公告)日: 1989-05-30
- 发明人: Kozo Sato , Shunichi Ishikawa , Ken Kawata
- 申请人: Kozo Sato , Shunichi Ishikawa , Ken Kawata
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX61-167558 19860716; JPX61-167559 19860716
- 主分类号: G03C1/61
- IPC分类号: G03C1/61 ; G03F7/028
摘要:
A process for formation of a base, which comprises reacting an acetylide compound with a salt. The acetylide compound has the following formula:(R--C.tbd.C--).sub.n Mwherein R is a monovalent group selected from the group consisting of an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group and a heterocyclic group, each of which may have one or more substituent groups; M is an n-valent transition metal atom; and n is 1, 2 or 3. The salt is composed of an anion having an affinity for the transition metal (M) (the affinity of the anion for the transition metal is more than that of the acetylide anion (R--C.tbd.C.crclbar.)), and a cation derived from one selected from the group consisting of an alkali metal, an alkaline earth metal, ammonia and an organic base. A light-sensitive material containing the acetylide compound and the salt is also disclosed.
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