发明授权
- 专利标题: CO.sub.2 gas laser device
- 专利标题(中): 二氧化碳气体激光装置
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申请号: US270376申请日: 1988-11-10
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公开(公告)号: US4841538A公开(公告)日: 1989-06-20
- 发明人: Satoru Yanabu , Hideomi Takahashi , Eiji Kaneko , Koichi Yasuoka
- 申请人: Satoru Yanabu , Hideomi Takahashi , Eiji Kaneko , Koichi Yasuoka
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX61-31788[U] 19860305
- 主分类号: H01S3/036
- IPC分类号: H01S3/036 ; H01S3/038 ; H01S3/0971
摘要:
A CO.sub.2 gas laser device comprises a plurality of divided cathode electrodes disposed in a linear row extending transversely across a high-speed flow of a gas containing CO.sub.2, and parts of the cathode electrodes producing negative glow are disposed at the same height as anodes at a downstream position. Additionally, a device for controlling the distribution of gas flow velocity, which functions doubly as means for creating turbulent flow, and a preliminary discharge electrode are disposed on the upstream side of the cathode electrodes, the former being set at a height position corresponding substantially to that of the middle portions of the cathode electrodes.
公开/授权文献
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