发明授权
- 专利标题: Shadow mask, and method of manufacturing the same
- 专利标题(中): 阴影面具及其制造方法
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申请号: US281868申请日: 1988-12-08
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公开(公告)号: US4846747A公开(公告)日: 1989-07-11
- 发明人: Emiko Higashinakagawa , Yasuhisa Ohtake , Masaharu Kanto , Fumio Mori
- 申请人: Emiko Higashinakagawa , Yasuhisa Ohtake , Masaharu Kanto , Fumio Mori
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX61-157292 19860704
- 主分类号: H01J9/14
- IPC分类号: H01J9/14 ; H01J29/07
摘要:
An ingot of an Invar alloy is rolled in one direction into a plate, a number of slot holes are formed in this plate, and the plate is pressed into a curved form, thus providing a shadow mask of a color CRT. The slot holes of this shadow mask have longitudinal axes extending substantially at right angles to the rolling direction of the plate. The holes maintain their shapes after the plate has been pressed.