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US4853081A Process for removing contaminant 失效
去除污染物的方法

Process for removing contaminant
摘要:
Contaminant is removed from the interior of the holes in the vicinity of preselected locations by etching in a gaseous plasma wherein the sheath voltage is controlled in order to direct ions of the plasma to contact the interior of the holes in the vicinity of the preselected locations.
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