发明授权
- 专利标题: Coating solution for forming a silica-based coating film
- 专利标题(中): 用于形成二氧化硅基涂膜的涂布溶液
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申请号: US277497申请日: 1988-11-30
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公开(公告)号: US4865649A公开(公告)日: 1989-09-12
- 发明人: Eiichi Kashiwagi , Muneo Nakayama , Akira Hashimoto , Toshihiro Nishimura
- 申请人: Eiichi Kashiwagi , Muneo Nakayama , Akira Hashimoto , Toshihiro Nishimura
- 申请人地址: JPX Kanagawa
- 专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX61-273018 19861118
- 主分类号: C08L83/00
- IPC分类号: C08L83/00 ; C08L83/02 ; C09D4/00 ; C09D183/00 ; C09D183/04
摘要:
The coating solution of the invention is useful for forming a silica-based coating layer on a substrate such as semiconductor silicon wafers in the manufacturing process of semiconductor devices such as VLSIs. The coating solution is particularly advantageous to smooth a substrate surface having a difference in levels by completely filling the recessed areas. The coating solution is an organic solution of a cohydrolyzate of an alkoxy silane mixture composed of at least two kinds of di-, tri- and tetraalkoxy silane compounds such as a combination of methyl trimethoxy silane and tetramethoxy silane in a specified molar ratio and can be prepared by adding water to an organic solution of these alkoxy silane compounds without using any acid catalyst to effect the cohydrolysis of the silane compounds.
公开/授权文献
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