发明授权
- 专利标题: Dynamic random access memory having buried word lines
- 专利标题(中): 具有掩埋字线的动态随机存取存储器
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申请号: US155698申请日: 1988-02-16
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公开(公告)号: US4873560A公开(公告)日: 1989-10-10
- 发明人: Hideo Sunami , Shinichiro Kimura , Toru Kaga
- 申请人: Hideo Sunami , Shinichiro Kimura , Toru Kaga
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-77416 19870401
- 主分类号: H01L27/10
- IPC分类号: H01L27/10 ; H01L21/8242 ; H01L27/108
摘要:
This invention relates to a very large scale dynamic random access memory, and discloses a memory cell having a reduced step on the device surface portion and being hardly affected by incident radioactive rays. In a semiconductor memory consisting of a deep hole bored in a semiconductor substrate, a capacitor formed on the sidewall portion at the lower half of the deep hole and a switching transistor formed immediately above the capacitor, at least the half of a word line constituting the gate of the switching transistor is buried in an elongated recess formed at the surface portion of the semiconductor substrate.
公开/授权文献
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