发明授权
- 专利标题: Observation system for a projection exposure apparatus
- 专利标题(中): 投影曝光装置的观察系统
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申请号: US333727申请日: 1989-04-03
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公开(公告)号: US4888614A公开(公告)日: 1989-12-19
- 发明人: Akiyoshi Suzuki , Hideki Ina , Masao Kosugi
- 申请人: Akiyoshi Suzuki , Hideki Ina , Masao Kosugi
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX61-125102 19860530; JPX61-136182 19860613
- 主分类号: G03F9/00
- IPC分类号: G03F9/00
摘要:
An observation system, usable with a projection optical system for optically projecting a first object upon a second object by use of a light of a first wavelength, for observing the second object by way of the projection optical system and by use of a light of a second wavelength different from the first wavelength. The observation system includes an observation optical system having a lens element and a parallel-surface plate which is inclined with respect to an optical axis of the observation optical system, wherein the observation optical system is arranged to form an image of the second object on a predetermined image surface and wherein the parallel-surface plate is arranged to substantially correct coma caused by the projection optical system.
公开/授权文献
- US6139322A Denture 公开/授权日:2000-10-31