发明授权
- 专利标题： Antistatic photographic base and light-sensitive element
- 专利标题（中）： 防静电摄影底座和感光元件
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申请号： US278358申请日： 1988-12-01
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公开(公告)号： US4914018A公开(公告)日： 1990-04-03
- 发明人: Mauro Besio , Alberto Valsecchi
- 申请人： Mauro Besio , Alberto Valsecchi
- 申请人地址： MN St. Paul
- 专利权人： Minnesota Mining and Manufacturing Company
- 当前专利权人： Minnesota Mining and Manufacturing Company
- 当前专利权人地址： MN St. Paul
- 优先权： ITX23024A/87 19871216
- 主分类号： G03C1/89
- IPC分类号： G03C1/89
摘要：
An improved antistatic base comprises a polymeric support film having coated thereon in sequence a first antistatic layer comprising a quaternary polyelectrolyte compound and a polymeric hydrophobic binder and a second protective layer comprising a polymeric hydrophobic binder, wherein said quaternary polyelectrolyte compound is a homopolymer or a copolymer of a diallyldialkylammonium salt compound.The antistatic base is particularly useful as a support for light-sensitive silver halide photographic elements.
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