发明授权
- 专利标题: Focusing in instruments, such as SEMs and CRTs
- 专利标题(中): 专注于仪器仪表,如SEM和CRT
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申请号: US333059申请日: 1989-04-03
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公开(公告)号: US4929836A公开(公告)日: 1990-05-29
- 发明人: Albert Sicignano , Mehdi Vaez-Iravani
- 申请人: Albert Sicignano , Mehdi Vaez-Iravani
- 申请人地址: NY New York
- 专利权人: North American Philips Corporation
- 当前专利权人: North American Philips Corporation
- 当前专利权人地址: NY New York
- 主分类号: G01Q30/02
- IPC分类号: G01Q30/02 ; H01J37/28
摘要:
A significantly improved focusing technique is set forth for use with electron beams, particularly in scanning electron microscopes and/or CRTs. This technique utilizes an in-situ differential signal measurement of an object surface to form a signal which is particularly sensitive to edges in the sample at a superimposed frequency. Perfect focus is obtained when the signal strength at the superimposed frequency is a maximum thereby resulting in a minimum spot size.
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