发明授权
- 专利标题： Surface treatment for thin metal or semiconductor oxide coatings
- 专利标题（中）： 表面处理薄金属或半导体氧化物涂层
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申请号： US297143申请日： 1989-01-13
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公开(公告)号： US4937055A公开(公告)日： 1990-06-26
- 发明人: Wilfred C. Kittler , Darrell Stoddard
- 申请人： Wilfred C. Kittler , Darrell Stoddard
- 申请人地址： CA Canoga Park
- 专利权人： Andus Corporation
- 当前专利权人： Andus Corporation
- 当前专利权人地址： CA Canoga Park
- 主分类号： C23C22/83
- IPC分类号： C23C22/83
摘要：
The adherablility of a thin coating of a metal or semiconductor oxide, such as indium tin oxide or silicon dioxide, is improved by treating the coating with an aqueous solution containing an effective amount of an active oxygen compound such as sodium hypochlorite or hydrogen peroxide.
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