Surface treatment for thin metal or semiconductor oxide coatings
    1.
    发明授权
    Surface treatment for thin metal or semiconductor oxide coatings 失效
    表面处理薄金属或半导体氧化物涂层

    公开(公告)号:US4937055A

    公开(公告)日:1990-06-26

    申请号:US297143

    申请日:1989-01-13

    IPC分类号: C23C22/83

    CPC分类号: C23C22/83 Y10T156/10

    摘要: The adherablility of a thin coating of a metal or semiconductor oxide, such as indium tin oxide or silicon dioxide, is improved by treating the coating with an aqueous solution containing an effective amount of an active oxygen compound such as sodium hypochlorite or hydrogen peroxide.

    摘要翻译: 通过用含有效量的活性氧化合物如次氯酸钠或过氧化氢的水溶液处理涂层来改善金属或半导体氧化物(例如氧化铟锡或二氧化硅)的薄涂层的粘附性。

    Transparent electrode fabrication
    3.
    发明授权
    Transparent electrode fabrication 失效
    透明电极制造

    公开(公告)号:US4838656A

    公开(公告)日:1989-06-13

    申请号:US211107

    申请日:1988-06-21

    申请人: Darrell Stoddard

    发明人: Darrell Stoddard

    摘要: A panel for a liquid crystal or other visual display is formed by depositing onto a transparent backing a transparent conductive material, such as indium-tin oxide, and then a metal such as nickel that will serve as a bus to power the transparent conductive material. The nickel is first etched to a bus configuration, and then the indium-tin oxide is etched to produce one or more picture elements.

    摘要翻译: 通过将透明导电材料(例如氧化铟锡)沉积在透明背衬上,然后将诸如镍的金属作为总线来为透明导电材料供电来形成用于液晶或其它视觉显示器的面板。 首先将镍蚀刻到总线配置,然后蚀刻氧化铟锡以产生一个或多个像素。

    Thin film artwork compounds
    4.
    发明授权
    Thin film artwork compounds 失效
    薄膜艺术品

    公开(公告)号:US5011569A

    公开(公告)日:1991-04-30

    申请号:US469879

    申请日:1990-01-24

    IPC分类号: G03F1/54 G03F1/80 H05K3/00

    CPC分类号: G03F1/54 G03F1/80 H05K3/0002

    摘要: A graphic artwork includes a thin film coating layer thereon which includes a copper oxide which is substantially opaque to ultraviolet light and partially transmissive to visible light and suitable for printing circuiting on a printed circuit board or for other graphic artwork. In the case where the thin film compound includes unoxidized copper, etching thereof to achieve a predetermined pattern on the graphic artwork is facilitated by using a mixture of ammonium chloride and hydrogen peroxide.

    摘要翻译: 图形艺术品包括其上的薄膜涂层,其包括对紫外线基本上不透明的部分氧化铜,并且对可见光部分透射并适合于在印刷电路板上或其它图形图形上的印刷电路。 在薄膜化合物包括未氧化铜的情况下,通过使用氯化铵和过氧化氢的混合物来促进在图形图形上实现预定图案的蚀刻。

    Thin film artwork compounds
    5.
    发明授权
    Thin film artwork compounds 失效
    薄膜艺术品

    公开(公告)号:US4940627A

    公开(公告)日:1990-07-10

    申请号:US469878

    申请日:1990-01-24

    IPC分类号: G03F1/54 G03F1/80 H05K3/00

    摘要: A graphic artwork includes a thin film coating layer thereon which includes a copper oxide which is substantially opaque to ultraviolet light and partially transmissive to visible light and suitable for printing circuiting on a printed circuit board or for other graphic artwork. In the case where the thin film compound inlcudes unoxidized copper, etching thereof to achieve a predetermined pattern on the graphic artwork is facilitated by using a mixture of ammonium chloride and hydrogen peroxide.

    摘要翻译: 图形艺术品包括其上的薄膜涂层,其包括对紫外线基本上不透明的部分氧化铜,并且对可见光部分透射并适合于在印刷电路板上或其它图形图形上的印刷电路。 在薄膜化合物引入未氧化的铜的情况下,通过使用氯化铵和过氧化氢的混合物来促进在图形图形上实现预定图案的蚀刻。