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US4937643A Devices having tantalum silicide structures 失效
具有硅化钽结构的器件

Devices having tantalum silicide structures
摘要:
A method for fabricating a device which includes a tantalum silicide structure, and which is essentially free of conductive etch residues, is disclosed. The method includes the steps of depositing tantalum and silicon onto a substrate, patterning the tantalum and silicon, and then sintering the patterned tantalum and silicon to form a patterned layer of tantalum silicide.
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