发明授权
- 专利标题: Heat-treating apparatus
- 专利标题(中): 热处理装置
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申请号: US272415申请日: 1988-11-17
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公开(公告)号: US4938691A公开(公告)日: 1990-07-03
- 发明人: Wataru Ohkase , Ken Nakao , Seishiro Sato
- 申请人: Wataru Ohkase , Ken Nakao , Seishiro Sato
- 申请人地址: JPX Kanagawa
- 专利权人: Tel Sagami Limited
- 当前专利权人: Tel Sagami Limited
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX62-290164 19871117; JPX62-290165 19871117
- 主分类号: H01L21/22
- IPC分类号: H01L21/22 ; C30B31/10 ; H01L21/31
摘要:
A heat-treating apparatus includes a furnace for heat-treating wafers, installed so as to set its longitudinal direction vertically and having an opening which is formed in its lower end so as to allow a boat having semiconductor wafers mounted thereon to be loaded, a heat-insulating cylinder on which the boat is placed and which is adapted to keep the boat hot, a lifting unit for lifting and loading the boat and the heat-insulating cylinder into the furnace, and for lowering and unloading them from the furnace, a moving unit for pivoting the heat-insulating cylinder and retracting the cylinder from below the boat, and a handler unit for supporting and vertically moving the boat. After the wafers are heat-treated, the boat is moved downward by the lifting unit. The heat-insulating cylinder is retracted from below the boat by the moving unit while the boat is supported by the handler unit. Subsequently, the boat is further lowered by the handler unit so as to completely remove the boat from the furnace.
公开/授权文献
- US5568917A Apparatus for calipering a collated assemblage 公开/授权日:1996-10-29
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