发明授权
- 专利标题: Method and apparatus for detecting abnormal patterns
- 专利标题(中): 用于检测异常模式的方法和装置
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申请号: US184787申请日: 1988-04-22
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公开(公告)号: US4952058A公开(公告)日: 1990-08-28
- 发明人: Minori Noguchi , Hiroaki Shishido , Mitsuyoshi Koizumi
- 申请人: Minori Noguchi , Hiroaki Shishido , Mitsuyoshi Koizumi
- 申请人地址: JPX Tokyo
- 专利权人: Hitach, Ltd.
- 当前专利权人: Hitach, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-101745 19870427; JPX62-151121 19870619
- 主分类号: G01N21/94
- IPC分类号: G01N21/94 ; G01N21/956 ; G03F7/20
摘要:
A system for detecting abnormal patterns in a surface pattern on the surface of a sample wherein, when the abnormal pattern has a portion smaller than the surface pattern, the light for illuminating the sample is stopped down to an opening so that the abnormal pattern can be distinguished over the surface pattern, the surface pattern is limited to a predetermined opening by the illumination light to form an image on a detector, and the surface pattern detected by the detector is processed to detect the abnormal pattern in the surface pattern. Further, the plurality of light rays having good directivity are illuminated onto a point on the surface of the sample from dissimilar directions maintaining a predetermined angle of incidence, the detect signals are separated to be corresponded to said light rays, and the above processing is carried out to enhance the precision of detection.
公开/授权文献
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