发明授权
US4958317A Nonvolatile semiconductor memory device and a writing method using
electron tunneling
失效
非易失性半导体存储器件和使用电子隧穿的写入方法
- 专利标题: Nonvolatile semiconductor memory device and a writing method using electron tunneling
- 专利标题(中): 非易失性半导体存储器件和使用电子隧穿的写入方法
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申请号: US224743申请日: 1988-07-27
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公开(公告)号: US4958317A公开(公告)日: 1990-09-18
- 发明人: Yasushi Terada , Kazuo Kobayashi , Takeshi Nakayama
- 申请人: Yasushi Terada , Kazuo Kobayashi , Takeshi Nakayama
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-187962 19870727
- 主分类号: G11C17/00
- IPC分类号: G11C17/00 ; G11C16/04 ; G11C16/10
摘要:
Externally inputted data of one word line is temporarily stored in a latch circuit. In the writing cycle, the data stored and held in the latch circuit is collectively written in memory transistors connected to the selected word line. On this occasion, 0 V is applied to one of the control gate and the drain of the memory transistor in which "0" is written and a high voltage V.sub.PP is applied to the other of the control gate and the drain. Therefore, not only in the erasing cycle but also in the writing cycle, the operation is carried out by the movement of charges caused by the electron tunneling.
公开/授权文献
- US5657129A Method and apparatus for the alignment of a substrate 公开/授权日:1997-08-12
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