发明授权
- 专利标题: Method of monitoring semiconductor manufacturing processes and test sample therefor
- 专利标题(中): 监测半导体制造工艺的方法及其试样
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申请号: US151436申请日: 1988-02-02
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公开(公告)号: US4963500A公开(公告)日: 1990-10-16
- 发明人: George W. Cogan , Gary E. Miner , Lee A. Christel , James F. Gibbons
- 申请人: George W. Cogan , Gary E. Miner , Lee A. Christel , James F. Gibbons
- 申请人地址: CA Santa Clara
- 专利权人: Sera Solar Corporation
- 当前专利权人: Sera Solar Corporation
- 当前专利权人地址: CA Santa Clara
- 主分类号: G01R31/28
- IPC分类号: G01R31/28 ; H01L21/00 ; H01L21/66 ; H01L23/544
摘要:
Method of determining contaminants in a semiconductor processing apparatus in which a high purity, high carrier lifetime semiconductor test wafer is processed and the degradation of its carrier lifetime is determined.
公开/授权文献
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